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Semiconductor Chemicals - Request a Quote EMF utilises the proprietory DEOX(tm) process for the manufacture of Group III organometallics sources including:- DEOX(tm) TMAl, DEOX(tm) TMG, DEOX(tm) TMI and DEOX(tm) DEZn The DEOX(tm) process eliminates oxygen and associated impurities leading to improved device results. Two in-house MOCVD reactors enable routine growth testing of materials and correlates device performance to material quality. EMF have been appointed agents for FURUKAWA Co. in Europe and the USA for Group V precursors. VR Grade TBA, VR Grade TBP Advantages
over gaseous hydrides include:- enhanced and more
consistent quality, lower growth temperatures, higher
efficiency, reduced exhaust deposits, improved safety and
Sources are supplied in the unique UltraPurge(tm) bubbler, with the 3 valve configuration which eliminates contamination during bottle change over. A range of bubbler sizes are available. EMF
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