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EMF III/V Innovators
Saturn:- Vectored Flow Epitaxy. (VFE)

VFE:
Saturn’s high yield and uniform deposition is achieved by the unique manner in which the reagent gas is injected into the cell. The new process has been termed Vectored Flow Epitaxy (VFE) and is a major advance in MOCVD technology. The group V and III precursors are individually introduced into the cell to maximise reagent cracking and eliminate harmful pre-reactions.

VFE is suitable for atmospheric pressure cell operation.

Saturn's Cell:
The development team have utilised the latest CFD computer modelling to design a cell with ideal flow dynamics which combined with the VFE technology provides higher yeilds and improved reporducibility.
The cell is IR lamp heated to allow for rapid temperature ramping and reduced cycle times. The cell furniture has been designed to be readily removed for ease of maintenance and reduced cleaning times.

CapacityMinMax
2" wafers1020
3" wafers813
4" wafers48

EMF LIMITED
Unit 5 Chesterton Mills, French's Road
Cambridge CB4 3NP, England.
Telephone: +44 (0)1223 - 352 244
Facsimile: + 44 (0)1223 - 352 444

Email: information@emf.co.uk

Titan
CFD Calculations of flow dynamics

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